The Institute for Microstructure Technology (IMT) operates the cleanroom facility which is equipped with three LIGA beamlines to perform X-ray lithography. Each beamline is dedicated to a specific task in the LIGA-process, which are high resolution X-ray mask making (LITHO 1), deep X-ray lithography (LITHO 2) and ultra deep X-ray lithography (LITHO 3), depending of the available spectrum, which is filtered by a dedicated mirror in case of LITHO 1 and LITHO 2.
|Beamline||Technical/ scientific application||Experimental station||Specification||Source|
|LIGA I||Mask fabrication, patterning of thin microstructures||Scanner||Energy range: 2.2 - 3.3 keV||Dipole magnet|
|LIGA II||Deep x-ray lithography||Scanner||Energy range:
2.5 - 12.4 keV
|LIGA III||Ultra deep x-ray lithography||Scanner||Energy range:
2.5 - 15.0 keV