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Real-time X-ray diffraction imaging for semiconductor wafer metrology and high temperature in situ experiments

Real-time X-ray diffraction imaging for semiconductor wafer metrology and high temperature in situ experiments
Authors: A. N. Danilewsky, J. Wittge, A. Hess, A. Cröll, A. Rack, D. Allen, P. J. McNally, T. dos Santos Rolo, P. Vagovič, T. Baumbach, J. Garagorri, M. R. Elizalde, B. K. Tanner
Source: Physica Status Solidi A 208, 2499-2504
Date: 2011