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Real time X-ray diffraction imaging for semiconductor wafer metrology and high temperature in-situ experiments

Real time X-ray diffraction imaging for semiconductor wafer metrology and high temperature in-situ experiments
Authors:

A. N. Danilewsky, J. Wittge, A. Hess, A. Cröll, A. Rack, D. Allen, P. McNally, T. dos Santos Rolo, P. Vagovic, T. Baumbach, J. Garagorri, M. R. Elizalde, B. K. Tanner,

Source:

Physica Status Solidi A 208 (2011) 2499-2504

Date: 2011