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LIGA uses deep X-ray lithography with synchrotron radiation for the production of high aspect ratio polymer microstructures. By shadow printing an X-ray mask is copied into an X-ray sensitive resist. A chemical developer dissolves the irradiated areas. Free lateral shape, structures heights from 20 µm up to several millimetres, vertical sidewalls with optical quality (Ra < 20 nm) and sub µm structure details are the basic characteristics of this process step.

The whole laboratory is placed inside a clean room for accurate environment conditions. The experimental equipment, together with the microstructure fabrication capabilities at IMT/FZK, is a unique installation for high precision and high aspect ratio microstructure fabrication. Even the resist preparation, development and optional electroformimg process is done by using the clean room capabilities and expertise of IMT.

The microstructure laboratory at ANKA consists of three beamlines for deep x-ray lithography, each dedicated to a specific task in the LIGA-process. In this chapter we present the LIGA1 beamline, dedicated to high resolution X-ray mask making and thin film X-ray lithography (XRL). The typical data for the structural height is up to 100 microns with a smallest width of 5 µm. Smaller line widths as well as thinner structures are design dependent and therefore under further development according to the demands of the micro/nano interface.

Team LIGA 1
1 additional person visible within KIT only.

liga 1 complett

Energy range
2.2 - 3.3 keV
1.5 T Bending magnet, bending radius: 5.556 m
175 µm
Si/200nm Cr @ 15.4 mrad
Distance: source point-mask plane
14.84 m
Distance: source point -mirror
8,61 m
Be-window aperture
20 mm (vertical) x  110 mm (horizontal)
Usable horizontal fan
108 mm
Sample environment
100 mbar He
Experimental setup
JenOptik Dex02 X-ray scanner with tilting option (+/- 60°) and rotation option (362°)
Alignment / instrumental overlay accuracy
Internal, 0,5 µm
Title Author Source Date Link

M. Bohling, T. Seiler, B. Wdowiak, J. Jahns, J. Mohr, M. Börner 

Applied Optics 51 (2012) 5989-5995 

2012 PDF

V. Nazmov, J. Mohr, R. Simon 

J. Micromech. Microeng. 23, 095015 

2013 PDF
F. Greiner, S. Quednau, F. Dassinger, R. Sarwar, H. F Schlaak, M. Guttmann, P. Meyer Journal of Micromechanics and Microengineering 23, 025018 2013 PDF

V. Nazmov, E. Reznikova, J. Mohr, V. Saile, L. Vincze, B. Vekemans, S. Bohic, A. Somogyi 

Journal of Micromechanics and Microengineering 21 (2011) 015020-1-11 


S. Kinuta, Y. Saita, M. Kobayashi, M. Boerner, V. Saile, S. Hosaka 

Microsystem Technologies - Micro- and Nanosystems. Information Storage and processing Systems 16 (2010) 1299-1302