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Nano-meter resolution X-ray topography (nm-XRT)

Nano-meter resolution X-ray topography (nm-XRT)
place:new ANKA seminar room, building 348, 2nd floor, entrance western side Affiliation:

Singapore Synchrotron Light Source (SSLS), National University of Singapore

Date:12.09.2013
Inviting person:Pawel Wesolowski, KIT-ANKA
Speaker:

Ping Yang

Time:11.00 a.m.

Abstract:

We have proposed Nano-meter resolution X-ray topography (nm-XRT). The principle and whole system will be reviewed (Fig. 1). More detailed info around a single defect and strain field with several tens of nm resolution can be achieved. The high spatial resolution for the method and system is limited by X-ray optic limitation, including the outer-most width in the objective FZP and coherence of incident X-rays. Using high quality and high-resolution FZPs and high coherent X-ray sources can overcome it. There is no better way compatible to have so high-resolution X-ray topography than this invention.
 
The crystal samples can diffract incident X-rays in either transmission or reflection geometry. So the topography can be realized in transmission or reflection geometry in conjunct with transmission X-ray microscopy (TXM). Actually TXM serves as an analyzer to obtain XRT image. The feasibility has been tested in reflection geometry respectively using “half-field” (shielded) mode [1] and scan mode [2], from which the practical resolution of 0.5 µm was obtained.
 
Ref:
1. H.H. Solak, C. David, J. Gobrecht and M. Drakopoulos, J. Phys. D, Appl. Phys. 36 (2003) A128–A132.
2. R. Tanuma and T. Kubo, Japanese Journal of Applied Physics, 45(2006)5280–5282.
 
Fig. 1:

ANKA seminar 12.09.2013