Home | Legals | Sitemap | KIT

Studies on Defect Reduction in AlGaN Heterostructures by Integrating an In-situ SiN Interlayer

Studies on Defect Reduction in AlGaN Heterostructures by Integrating an In-situ SiN Interlayer
Authors: F. Scholz, K. Forghani, M. Klein, O. Klein, U. Kaiser, B. Neuschl, I. Tischer, M. Feneberg, K. Thonke, S. Lazarev, S. Bauer, T.Baumbach
Source: Japanese Journal of Applied Physics 52, 08JJ07
Date: 2013