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Non-Invasive Nano-Imaging of Ion implanted and Activated Copper in Silicon

Non-Invasive Nano-Imaging of Ion implanted and Activated Copper in Silicon
Authors:

F. Ballout, J.-S. Samson, D. A. Schmidt, E. Bründermann, Y.-L. Mathis, B. Gasharova, A. D. Wieck, M. Havenith 

Source:

Journal of Appled Physics 110 (2011) 024307-1-7 

Date: 2011