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X-ray Lithography

The Institute for Microstructure Technology (IMT) operates the cleanroom facility which is equipped with three LIGA beamlines to perform X-ray lithography. Each beamline is dedicated to a specific task in the LIGA-process, which are high resolution X-ray mask making (LITHO 1), deep X-ray lithography (LITHO 2) and ultra deep X-ray lithography (LITHO 3), depending of the available spectrum, which is filtered by a dedicated mirror in case of LITHO 1 and LITHO 2.


Beamline Technical/ scientific application Experimental station Specification Source
LIGA I Mask fabrication, patterning of thin microstructures Scanner Energy range: 2.2 - 3.3 keV Dipole magnet
LIGA II Deep x-ray lithography Scanner Energy range:
2.5 - 12.4 keV
Dipole magnet
LIGA III Ultra deep x-ray lithography Scanner Energy range:
2.5 - 15.0 keV
Dipole magnet